Convertible reactive ion etching benchtop plasma cleaning. Standard recipes cf4 o2 chf3 o2 c2f6 o2 cf4 ar h2 cf4 chf3 o2 c2f6 chf3 o2 o2. While some other companies have systems that are obsolete after 7 years, plasma etch continuously offers support, service, and replacement parts to keep your system running smoothly. Surface cleaning, and surface treatment andor etching of various materials. In plasma etcher, high etch rates at moderate power levels of 100 watts forward power can be achieved 200 aminute for oxide and 500aminute for nitride. Oxygen radicals increase the surface tension, and bombarding with argon atoms creates a microsandblasting effect. The plasma etch tabletop product range comprises lowcost compact plasma cleaner models, ideal for processing smaller samples, through to systems with multiple shelves for. Pe rie compact plasma etch and reactive ion etch rie system. Plasma clean and etching system with many features not found in competitive units. Then, perform 8min, 150w, 75sccm o2 plasma cleaning to remove byproduct polymers. The pe 50 is a feature packed, low cost, entry level option for plasma treatment. The mps series is also available as an oem module to.
Technics pe ii planar etch ii plasma etcher asher with. The silicon cannot be exposed to the plasma, or the etch rate will suffer. Az4110p photoresist etch rate is roughly 20 nmmin with an o2 plasma at full power and 200 mtorr pressure. In fact, the very first system plasma etch built in 1982 is still in use today. This model is available in one of three possible configurations. In addition to organic removal, the oxygen plasma is also useful for changing the surface polarity of organic films to facilitate wetting of waterbased surface etchants. Thermal dynamics ultracut 200 xt operating manual pdf. Selective plasma etching of polymeric substrates for advanced. Plasma therm 700 series wafer batch plasma etcher and. Larger tabletop plasma cleaner with rie reactive ion etching capability and more. Rainbow 4500 plasma etcher series mainenance manual. Chamber 1 before running your devices, you should do a 5 or 10 min dummy run of the film you plan to deposit.
Plasma etch pe series plc programming knowledge base. The pe 100 is a complete plasma treatment solution capable of reactive ion etching, plasma functionalization, and more. Weve developed a wide range of solutions for plasma cleaning, plasma etching, reactive ion etching rie, plasma treatment, surface modification, and other facets of plasma processing. Tegal 901e plasma etcher plasma etch equipment semistar. Photos for this item before purchasing, please read all terms. This model is perfect for manufacturers, medical facilities, universities, research facilities, or any other company in need of a costeffective, productiongrade plasma processing solution. Pe 200 industrial benchtop plasma processing system. It is a good idea to send the susceptor to the growth temperature while performing the plasma clean to save time later it takes about 30 min for the susceptor to. Plasma etch pe2575 plc programming how to programme and control a pe25, pe50, pe75 using the plc interface ikb047. The pe 25 is exceptionally user friendly and produces consistent results every time, featuring a robust aluminium chamber, rf powered electrode and automatic process sequence. Pe 50 plasma etcher the plasma etching is a dry etching process whereby the surface material is removed by plasma processes at low pressure.
Robert wieland, in handbook of silicon based mems materials and. As in all plasma etch cleaning systems, the pe 50 utilises a capacitive parallel plate design for the most effective plasma generation and is suitable for processing up to 100x150mm samples. Plasma therm 700 series wafer batch plasma etcher deposition. The pe200 is a complete industrial grade plasma treatment solution capable of plasma cleaning, plasma etching, reactive ion etching, and more. The company has grown to become a leading manufacturer of plasma cleaning and etching systems. The technics pe ii is a plasma induced etcher that can be used for photoresist ashing. Oxford instruments plasma technology london centre for. The tegal 901e plasma etcher plasma etch semiconductor equipment were made by tegal corporation and represents the industry standard in singlewafer dry etch of polysilicon, nitride, silicon oxide and the mainstay of the highly successful plasma etch system. For more information about the pe 25 plasma cleaner, visit ou.
Plasma etch system plasmaetch pe200 wisconsin centers. The technics peiia is a plasma etching system used for descummingashing of photoresist and nitride etching. Tegal 9xx plasma etcher solenoid valve assy sndrcv 31173. Note that the substrate heater is disconnected, so the heater dial in the upperleft corner does not work. Electron microscopy sciences plasma etcher model pe 2000. Its a robust machine that is perfect for small production facilities, research labs, universities, or any industry which needs a smallscale, costeffective plasma treatment solution. The pe200 is a complete industrial grade plasma treatment solution capable of plasma cleaning, etching, reactive ion etching rie, and more. This robust, reliable and yet quite affordable system was developed for the busy 247 manufacturing firm that cannot have downtime. Used plasma etch plasma etch pe200 plasma system hgr. Refurbished and fully tested is optional at extra charge. Plasma etch processes can remove virtually all types of materials used in semiconductor industry. This listing is for a tegal plasmaline model 421 barrel etch plasma system wafer etcher w gauges local pickup always welcome.
Plasma etching cleans organic contamination from metal, ceramic, or plastic surfaces, which enhances the adhesive and bond strength of such surfaces. Configured for optimal gas conductance at the wafer maximizing etch rate and uniformity. Pe 100 plasma etch benchtop plasma system description. The unit is capable of 150 watts rf forward power at. Tegal plasmaline 200 plasma barrel etcher semistar. Hitachi mm5121 pcb card m511e microwave plasma etching system working. Sep 19, 2019 carson city, nv plasma etch inc, a leader in plasma innovation, recently announced its polymerization line of plasma systems. The all aluminum chamber features over 240 square inches of active processing surface with the three level standard configuration. Amat centura dps ii metal etch plasma etch semiconductor. This pe 200 benchtop plasma etch system is fully automated and is capable of processing multiple parts up to x16. The pe 200 is an industrial strength bench top plasma etching system supplied with an oxygen service vacuum pump. Plasma etcher model pe 2000, electron microscopy sciences vwr. Compared to the wet chemical etching, plasma etching is capable of controlled and precise etching at very small scales 10 nm. Manual load or a variety of vacuum load locks are available.
Every new plasma system from plasma etch comes standard with a one year warranty. This model is perfect for manufacturers, universities, research facilities, or any other company in need of a costeffective, high yield plasma. System one etcher matrix 302 plasma etcher read more. The pe 2000 rf plasma etcher is specifically designed for reactive gas plasma etching and surface treatments. The pe200 is our industrial strength bench top plasma etching system and supplied with an oxygen. Plasma cleaning from the front panel, download the cleanpurge recipe and, using manual process control, perform a 30 min plasma clean of cf4 and o2 example panel on the left below. The type of the active gasses and their ratio is selected depending on the type of material to be.
We sell it at refurbished and upgraded condition with 12 months warranty location. Micro nanofabrication services at ubc vancouvers anf. Plasma cleaning and etchers plasma clean plasma etch, inc. The pe 100 is available in three unique configurations. Benchtop plasma cleaner for large devices or batch sizes inseto. For example, if you plan to do an rie process to etch silicon, the handle wafer must have a coating of either oxide or nitride. This document presumes the user is familiar with the low pressure plasma process and the plasma etch inc.
New polymerization plasma systems includes purpose built pe. Plasma etching, referred many times as plasma chemical etching or dry etching, of both organic and inorganic materials was reported for material fabrication in multidisciplinary applications. Review of potential problems for plasmaetch pe 50 machine. Plasma can be used to clean and etch odd shaped parts with.
Plasmaetch pe 200 plasma surface treatment and etching system is used for surface activation and etching with a variety of materials. Plasmaetch pe200 plasma surface treatment and etching system is used for surface activation and etching with a variety of materials. The pe200 is an industrial strength bench top plasma etching system and plasma cleaner supplied with an oxygen service vacuum pump. Plasma cleaning demo with the pe25 plasma cleaner from. The pe 50 plasma cleaning system can use up to two gases simultaneously to clean and modify the surface. Available at extra charge for the refurbished and fully tested condition. This robust, reliable and yet quite affordable system was developed for the busy 247 manufacturing firm that cannot have down. This is very important for wet etch processing through small, high aspect ratio photoresist holes or lines. Hitachi m511e microwave plasma etching system mapping sensor robot used working.
The pe 200 is our industrial strength bench top plasma etching system and supplied with an oxygen service vacuum pump. The versatile 400amp rated system combines fast cutting speeds, rapid process cycling, quick changeovers and high reliability, and delivers the ultimate in hyperformance mild steel. Plasma etch pe200 benchtop plasma cleaning system youtube. The machines incorporate advanced rf sources, providing highquality performance and optimum process results. Plasma etch pe series plc programming knowledge base document. Reactive ion etching and plasma desmear equipment, including the patented magna system which requires no cf4 gas for etch back. Plasma makes it possible to achieve a positive and gapfree connection of highperformance plastics e. Peekpekk and other materials in many cases, activation and light etching of the surfaces with an ionised oxygenargon gas mix makes the application of primers redundant. The clean design features an industrial powder coated frame to guard your processing environment from contamination.
Denton vacuum dv502 evaporatorsputtering system semistar. The pe200 is our industrial strength bench top system. John explains the operational and maintenance aspects of this innovative plasma cleaning etching system. The planar etch ii pe2 machine is a parallelplate plasma etcher. Benchtop plasma cleaner for large devices batch sizes. Tegal 9xx plasma etcher pcb sis5 sensor interface pn 99 200 005 rev b. The gases are controlled by the manual mass flow controllers visible at upper right while the plasma power is controlled by the rotary knob to the left of the touchpad panel. Hitachi manual remote power unit m511e microwave plasma etching system working.
Plasma etch pe 200 plasma etch pe 200 plasma system x 15 table 0520057 capacity. Benchtop plasma cleaner for large devices or batch sizes. This exciting new line of plasma coating systems includes purpose built pe 100, pe 200 and bt1 based machines. Plasma etch icp rie drie equipment and parts semistar. Hitachi pm021 pcb card m511e microwave plasma etching system working spare. One 200 sccm mass flow controller pirani vacuum gauge 01 torr.
Plasma etch pe100 200 benchtop systems with our new pc based controller. Plasma etch system plasmaetch pe200 wisconsin centers for. The plasma etching is a dry etching process whereby the surface material is removed by plasma processes at low pressure. When plasma cleaning your product, whether it be small or large plastic parts, medical implants, wafers or electronic components, you will find that all are uniformly treated in the bt1. Full demonstration of how simple it is to use a plasma etch, inc. Plasma cleaner plasma cleaning equipment tabeltop plasma. Technics pe ii planar etch benchtop plasma ashing ion etcher for 200mm 8. Switching time pressure rf coil power rf bias power gas flow sccm etch 858. Sts electrotech 320pc rie plasma etching system turbo pump. Welcome to the instructions for use for the oxford instruments plasma.
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